journal article·2020-10

Spin-Hall magnetoresistance in Ta/Cr/YIG trilayers with different Cr thicknesses

Rui Zhu, Tian Shang, Shuai Hu, Yuanyuan Zhang, Xuepeng Qiu, Wenjuan Cheng, Dongmei Jiang, Qingfeng Zhan

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Abstract

Abstract We report an investigation of spin-Hall magnetoresistance (SMR) in Ta/Cr/Y3Fe5O12 (Ta/Cr/YIG) trilayers with different thicknesses of the Cr inserted layer. The Ta/Cr/YIG film with a 1-nm-thick Cr layer shows a maximum SMR of 4.2 × 10 - 4 at 100 K, which is an order of magnitude larger than that previously reported in the Ta/YIG or Cr/YIG systems. The enhancement of SMR in the Ta/Cr/YIG is ascribed to the strong spin–orbit coupling (SOC) effect of both Ta and Cr and the anti-oxidation protection by the Ta coating. A negative SMR different from the conventional SMR is found for the Ta/Cr/YIG with the Cr thicknesses of 3 and 6 nm at the temperature below 100 and 260 K, respectively, which suggests the occurrence of the spin-flop coupling between the antiferromagnetic Cr and ferromagnetic YIG moments. Both the anisotropic magnetoresistance (AMR) and the anomalous-Hall resistance (AHR) indicate an induced ferromagnetism of Cr which is likely due to the spin-flop transition or the uncompensated magnetic moments. Our results suggest that the 3d transition metal Cr can be used as a spin current generator, and the antiferromagnetic structure of Cr can be employed to regulate the transport of spin current.
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Research context

OpenAlex topics: Magnetic properties of thin films · Magneto-Optical Properties and Applications · Physics of Superconductivity and Magnetism

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (29)

Show source-provided references
1. Hirsch · Phys. Rev. Lett. · 1999 · 83 · 183410.1103/PhysRevLett.83.1834 ↗
2. Zhang · Phys. Rev. Lett. · 2000 · 85 · 39310.1103/PhysRevLett.85.393 ↗
3. Kimura · Phys. Rev. Lett. · 2007 · 98
4. Nakayama · Phys. Rev. Lett. · 2013 · 11010.1103/PhysRevLett.110.206601 ↗
5. Chen · Phys. Rev. B · 2013 · 87
6. Hahn · Phys. Rev. B · 2013 · 87
7. Qu · Phys. Rev. B · 2014 · 8910.1103/PhysRevB.89.140407 ↗
8. Ding · Phys. Rev. B · 2014 · 90
9. Althammer · Phys. Rev. B · 2013 · 8710.1103/PhysRevB.87.224401 ↗
10. Isasa · Appl. Phys. Lett. · 2014 · 10510.1063/1.4897544 ↗
11. Shang · Phys. Rev. B · 2015 · 9210.1103/PhysRevB.92.165114 ↗
12. Qu · Phys. Rev. Lett. · 2013 · 11010.1103/PhysRevLett.110.067206 ↗
13. Lu · Phys. Rev. Lett. · 2013 · 110
14. Han · Phys. Rev. B · 2014 · 90
15. Fischer · Phys. Rev. Appl. · 2020 · 1310.1103/PhysRevApplied.13.014019 ↗
16. Wang · Phys. Rev. Lett. · 2014 · 113
17. Run-Wei Li
18. Hou · Phys. Rev. Lett. · 2017 · 11810.1103/PhysRevLett.118.147202 ↗
19. Luan · Appl. Phys. Lett. · 2018 · 11310.1063/1.5041865 ↗
20. Qiu · Nat. Mater. · 2018 · 17 · 57710.1038/s41563-018-0087-4 ↗
21. Run-Wei Li
22. Du · Phys. Rev. B · 2014 · 90
23. Qu · Phys. Rev. B · 2015 · 92
24. Onbasli · APL Mater. · 2014 · 210.1063/1.4896936 ↗
25. Janak · Phys. Rev. B · 1977 · 16 · 25510.1103/PhysRevB.16.255 ↗
26. Wang · Phys. Rev. Lett. · 1994 · 72 · 92010.1103/PhysRevLett.72.920 ↗
27. Zhan · Appl. Phys. Lett. · 2010 · 9610.1063/1.3367705 ↗
28. Charilaou · J. Appl. Phys. · 2015 · 11710.1063/1.4913594 ↗
29. Ambrose · Phys. Rev. Lett. · 1996 · 76 · 174310.1103/PhysRevLett.76.1743 ↗