Structure and magnetic properties of textured Nd(Fe,Ti)12Nx films

Highly c-axis-textured Nd(Fe,Ti)(12)N-x films were prepared by DC magnetron sputtering on Si(1 0 0) at 450 degrees C and subsequent nitriding. The as-deposited films contained mainly ThMn12 structure and a second phase alpha-Fe. The films retained the same structure after nitriding at 450 degrees C for 10 min, while the unit cell volume was increased by 3%. Typical coercivity and grain size of films, before and after nitiriding, were found to be '500 Oe, 140 nm'; and '2800 Oe, 170 nm', respectively. The coercivity mechanism was found to be nucleation of reverse-domain-type by fitting the Kronmuller model. (C) 2000 Elsevier Science B.V. All rights reserved.