Magnetic properties of FePd films grown on Si antidots

Abstract In this study, 15 nm thick Si antidots were first fabricated by nanosphere lithography and reactive-ion etching on MgO (1 0 0) substrates. Then, 30 nm thick FePd alloy films were deposited on the Si antidots at 500 °C for 1 h. Through this method, we controlled the formation of FePd sub-micro dot arrays and FePd:Si matrix that formed by the interdiffusion between FePd alloy and Si antidots. Meanwhile, the investigation of magnetic force microscopy showed that the magnetic domains of FePd sub-micro dot arrays were separated by FePd:Si matrix.