Fe and Fe–N films sputter deposited at liquid nitrogen temperature

Abstract In order to realize soft magnetic thin films with a large saturation magnetization above 2 T, pure iron and nitrogen added iron films were deposited on glass slide substrates at liquid nitrogen temperature T liq. N by a DC magnetron sputtering. The pure iron films deposited at T liq. N and ion bombardment of 150 eV had a minimum coercive force of 2.4 Oe. In nitrogen added iron film, the crystallization of the film was suppressed more significantly at T liq. N than at room temperature T room , and the coercive force of the film deposited at T liq. N was smaller than the film deposited at T room . As a result, the film deposited at T liq. N and an optimum N 2 gas flow rate had a minimum coercive force of 1.5 Oe.