journal article·2001-01

Structural and magnetic properties of HCP-CoCrPt–SiO2 granular media

Yingfan Xu, Jian Ping Wang, Z.S Shan, Hua Jiang, Ying Su, Chong Tow Chong, Li Lu

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Abstract

Abstract Granular HCP-(CoCrPt) 100− x (SiO 2 ) x thin films with Cr underlayers have been fabricated by sputtering multilayers followed by post-deposition annealing. Magnetic and structural properties of the films for potential applications in magnetic recording media have been investigated in detail. In as-deposited films coercivities exceeding 2.5 kOe have been obtained with SiO 2 varying from 8 to 16 vol%; high coercivity of 5.6 kOe and anisotropy of 4.6×10 6 erg/cm 3 have been achieved at low M r t value (about 0.4 memu/cm 2 ) in the post-annealed films. VSM measurements showed that the magnetic moment lies well in the film plane under proper preparation conditions. Grain isolation in the magnetic layer was improved by segregating SiO 2 into grain boundaries and further enhanced by post-deposition annealing. The rapid increase of the coercivity upon annealing is most likely due to the significant decrease in intergranular exchange coupling, as shown by the δM measurement in which the peak value of δM curves changed from a positive value to a negative value upon annealing. Magnetic reversal properties of the films have also been systematically studied. These results show that the HCP-CoCrPt–SiO 2 granular film is a promising candidate for ultra-high-density recording media up to 100 Gbit/in 2 or beyond because of its low Pt content and desirable properties.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Magnetic properties of thin films · Copper Interconnects and Reliability

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (25)

Show source-provided references
1. E.N. Abarra, M. Suzuki, Okamoto, Areal density demonstrations announced by Fujitsu, INTERMAG 2000, AA-01, Toronto, April 2000.10.1109/INTMAG.2000.871781 ↗
2. Shimizu · IEEE Trans. Magn. · 1992 · 28 · 310210.1109/20.179726 ↗
3. Murayama · J. Appl. Phys. · 1994 · 75 · 614710.1063/1.355437 ↗
4. Hayashi · Nature · 1996 · 381 · 77410.1038/381772a0 ↗
5. Delaunay · Appl. Phys. Lett. · 1997 · 71 · 342710.1063/1.120356 ↗
6. Ichihara · IEEE Trans. Magn. · 1998 · 34 · 160310.1109/20.706629 ↗
7. Panagiotopoulos · J. Appl. Phys. · 2000 · 87 · 435810.1063/1.373078 ↗
8. Y. Xu, J.P. Wang, IEEE Trans. Magn. 36 (2000), in press.10.1109/20.908357 ↗
9. Y. Xu, Z.S. Shan, J.P. Wang, C.T. Chong, J. Magn. Magn. Mater., to be published.
10. McCurrie · Philos. Mag. · 1966 · 13 · 56710.1080/14786436608212648 ↗
11. Zhang · IEEE Trans. Magn. · 1990 · 26 · 138810.1109/20.104386 ↗
12. Fulerton · J. Appl. Phys. · 1997 · 81 · 593710.1063/1.364845 ↗
13. Yu · Appl. Phys. Lett. · 1999 · 75 · 399210.1063/1.125516 ↗
14. Yu · J. Appl. Phys. · 2000 · 87 · 695910.1063/1.372899 ↗
15. Chen · IEEE Trans. Magn. · 1999 · 35 · 346610.1109/20.800559 ↗
16. Christodoulides · J. Appl. Phys. · 2000 · 87 · 693810.1063/1.372892 ↗
17. Luo · Appl. Phys. Lett. · 1999 · 75 · 316210.1063/1.125264 ↗
18. Luo · J. Appl. Phys. · 2000 · 87 · 694110.1063/1.372893 ↗
19. Bae · J. Appl. Phys. · 2000 · 87 · 695310.1063/1.372897 ↗
20. Xu · J. Appl. Phys. · 2000 · 87 · 697110.1063/1.372903 ↗
21. Xu · J. Phys. D: Appl. Phys. · 2000 · 33 · 146010.1088/0022-3727/33/12/305 ↗
22. Johnson · J. Appl. Phys. · 2000 · 87 · 536510.1063/1.373349 ↗
23. Kelly · IEEE Trans. Magn. · 1989 · 25 · 388110.1109/20.42466 ↗
24. Sato · IEEE Trans. Magn. · 1993 · 29 · 368510.1109/20.281269 ↗
25. Bolzoni · IEEE Trans. Magn. · 1984 · 20 · 162510.1109/TMAG.1984.1063456 ↗