Fabrication and characterisation of Ni nanocontacts

Abstract We propose a simple method to make metallic nanocontacts. A gap is electrochemically etched in a Ni track. The gap resistance is monitored as material is redeposited from the solution to bridge the gap. I : V characteristics were compared with those of Ni nanocontacts fabricated using a focussed ion beam (FIB). The I : V characteristic is asymmetric above 200 K in both cases.