Influence of magnetron configuration on CoCr films sputtered on flexible substrates
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Abstract
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Magnetic properties of thin films · Magnetic Properties and Applications
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References (11)
Show source-provided references
1. B. Chapman, Glow Discharge Processes, 1980, p. 215.
2. A.S. Penfold, Magnetron sputtering, Handbook of Thin Film Process Technology, 1995, A.3.2.
3. Sheridan · J. Vac. Sci. Technol. A · 1990 · 8 · 3010.1116/1.577093 ↗
4. Savvides · J. Vac. Sci. Technol. A · 1986 · 4 · 50410.1116/1.573869 ↗
5. Window · J. Vac. Sci. Technol. A · 1986 · 4 · 19610.1116/1.573470 ↗
6. H. Jia, J. Veldeman, M. Burgelman, Presented at MRM'98.
7. Kawanabe · IEEE Trans. Magn. · 1991 · MAG-27 · 503110.1109/20.278730 ↗
8. Hoffman · J. Vac. Sci. Technol. A · 1994 · 12 · 95310.1116/1.579073 ↗
9. Nakai · IEEE Trans. Magn. · 1995 · MAG-31 · 283310.1109/20.490167 ↗
10. Deng · IEEE Trans. Magn. · 1993 · MAG-29 · 367610.1109/20.281266 ↗
11. Sin · IEEE Trans. Magn. · 1994 · MAG-30 · 400810.1109/20.333972 ↗