Formation of Sn nano-template by Hot-Wire Chemical Vapor Process on different substrates
Source abstract
Abstract
Abstract We report here a primer on the formation of Sn nano-template by Hot-wire Chemical Vapor Process on different substrates namely Stainless steel (SS 304), polished Si wafer and corning glass. The morphology of the as-deposited Sn film is found to be different on different substrates. On SS substrate, interestingly, the as-deposited Sn film is a naturally grown template of Sn nano-particles without any annealing required whereas on Si wafer and glass substrates it is in a quasi-continuous film form of Sn rather than a well-defined nano-template (well separated nano-particles) as in the former case. However, the as-deposited films on glass and Si wafer also turn into a defined template after annealing. It has been detected that all these Sn nano-particles are covered with a thin layer of SnO that has to be removed to enable the growth of SiNWs. Therefore, the morphology and the growth of SiNWs are found to be necessarily substrate dependent.
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Research context
OpenAlex topics: Nanowire Synthesis and Applications · Advancements in Semiconductor Devices and Circuit Design · Thin-Film Transistor Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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