journal article·2023-02

Suppression of p-type parasitic channel formation at the interface between the aluminum nitride nucleation layer and the high-resistivity silicon substrate

Pojung Lin, Jiazhe Liu, Hongche Lin, Zhiyuan Chuang, Wenching Hsu, Yiche Chen, Poliang Liu, Rayhua Horng

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OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor materials and devices · Acoustic Wave Resonator Technologies

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References (20)

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