Analytical–experimental approach for accurate depth profile evaluation of diffusion zone in plasma nitrided iron
Source abstract
Abstract
Nitrogen depth profile of diffusion zone in plasma nitrided pure iron was analytically calculated and experimentally measured. Nitrogen concentration equation was obtained versus nitriding temperature, time and diffusion distance. Plasma nitriding was carried out on pure iron substrate at 550°C in an atmosphere of 75H2–25N2. Nitrogen concentration depth profile in compound layer was characterised by glow discharge optical emission spectroscopy (GDOES) and for detection of nitrogen within the diffusion zone, secondary ion mass spectroscopy (SIMS) technique was employed. Nitrogen diffusion depths were measured accurately by optical and scanning electron microscopy as well as SIMS technique at different nitriding times. Experimental results indicated good agreement with calculated diffusion depths for various nitriding cycles. The extent of nitrogen diffusion depth in alpha zone, detected in this work for 10 h plasma nitriding at 550°C, was in excess of 2000 μm; such values have not been reported in previous investigations that conventionally used EDS, GDS, XPS or EPMA technique.
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · Ion-surface interactions and analysis
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Affiliations
Department of Materials Engineering Isfahan University of Technology, Isfahan 8415683111, Iran
Department of Materials Engineering Maleke-ashtar University of Technology, Isfahan 83145–115, Iran
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