Effects of bias on properties of Ti–C: H films coated by filtered cathodic vacuum arc
Source abstract
Abstract
A bias voltage apparatus is attached to the filtered cathode vacuum arc system for coating a diamond-like film containing Ti on WC substrate. Ti, which acts as the cathode target, is sputtered by plasma, and reacts with C2H2 gas, then deposits on the WC under working conditions of 60 A current and voltage between −50 and −275 V. Such processed diamond-like film containing Ti(Ti–C:H) is analysed by glow discharge spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy and nanoindentation for determining Ti concentration, crystallographic structure, bonding mode and mechanical properties. Characteristic parameters are determined to obtain suitable properties, and the underlying reasons are also addressed.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Metal and Thin Film Mechanics · Diamond and Carbon-based Materials Research · Advanced materials and composites
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Mechanical Engineering National Central University, Chung-li, Taiwan
Department of Electronic Engineering National Taiwan University, Taipei, Taiwan
Institute of Nuclear Energy Research Lungtan, Taiwan
Product R&D Department, DuPont Apollo, Hong Kong
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