journal article·2012-04

Effect of cyclic indentation on epitaxial GaN films

C-H Tsai, W-H Yau

Surface Engineering· Volume 28· Issue 3
Publisher page

Abstract

This paper describes the mechanisms of Berkovich nanoindentation induced mechanical deformation of GaN films under various loading–reloading cycles, analysed using cathodoluminescence, atomic force microscopy (AFM) and SEM. The AFM and SEM studies revealed that bursts, due to the nucleation of dislocations, occurred after nine loading–reloading cycles; these bursts resulted in incipient slip bands and/or the to and fro motion of mobile dislocations under the stress field. Cathodoluminescence analysis indicated the generation of individual dislocations and residual deformation on the GaN film; the decrease in hardness H can be used to determine the material properties of films undergoing repeated loading–reloading cycles.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Metal and Thin Film Mechanics · Acoustic Wave Resonator Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Automation Engineering Nan Kai University of Technology, Nantou 54243, Taiwan

Department of Mechanical Engineering Chin-Yi University of Technology, Taichung 411, Taiwan

References (38)

Show source-provided references
1. 10.1063/1.37114510.1063/1.371145 ↗
2. 10.1007/s11671-009-9310-110.1007/s11671-009-9310-1 ↗
3. 10.1143/JJAP.47.334610.1143/JJAP.47.3346 ↗
4. 10.1063/1.11559910.1063/1.115599 ↗
5. 10.1126/science.272.5269.175110.1126/science.272.5269.1751 ↗
6. 10.1038/386351a010.1038/386351a0 ↗
7. 10.1016/j.diamond.2008.09.01910.1016/j.diamond.2008.09.019 ↗
8. 10.1016/j.apsusc.2005.05.01910.1016/j.apsusc.2005.05.019 ↗
9. 10.1016/j.microrel.2010.05.00310.1016/j.microrel.2010.05.003 ↗
10. 10.1016/j.microrel.2010.02.01310.1016/j.microrel.2010.02.013 ↗
11. 10.1016/j.apsusc.2009.12.02210.1016/j.apsusc.2009.12.022 ↗
12. 10.1016/j.microrel.2009.08.00510.1016/j.microrel.2009.08.005 ↗
13. 10.1557/PROC-522-11310.1557/PROC-522-113 ↗
14. 10.1063/1.137220710.1063/1.1372207 ↗
15. 10.1016/S0927-796X(02)00008-610.1016/S0927-796X(02)00008-6 ↗
16. 10.1063/1.271901610.1063/1.2719016 ↗
17. 10.1016/S0921-5107(02)00048-X10.1016/S0921-5107(02)00048-X ↗
18. 10.1016/j.apsusc.2008.04.07810.1016/j.apsusc.2008.04.078 ↗
19. 10.1143/JJAP.42.L110.1143/JJAP.42.L1 ↗
20. 10.1063/1.290785110.1063/1.2907851 ↗
21. 10.1179/02670840132291142810.1179/026708401322911428 ↗
22. 10.1179/02670840110151767410.1179/026708401101517674 ↗
23. 10.1179/02670840322500616810.1179/026708403225006168 ↗
24. 10.1007/s11671-007-9106-010.1007/s11671-007-9106-0 ↗
25. 10.1016/j.apsusc.2009.09.05910.1016/j.apsusc.2009.09.059 ↗
26. 10.1557/jmr.2004.19.1.38010.1557/jmr.2004.19.1.380 ↗
27. 10.1179/02670840332249917310.1179/026708403322499173 ↗
28. 10.1179/026708408X37530710.1179/026708408X375307 ↗
29. 10.1179/174329409X45113710.1179/174329409X451137 ↗
30. 10.1016/j.apsusc.2009.12.05410.1016/j.apsusc.2009.12.054 ↗
31. 10.1557/JMR.1992.156410.1557/JMR.1992.1564 ↗
32. 10.1007/s11671-007-9106-010.1007/s11671-007-9106-0 ↗
33. 10.1016/j.apsusc.2008.04.07810.1016/j.apsusc.2008.04.078 ↗
34. 10.1016/j.apsusc.2007.08.02210.1016/j.apsusc.2007.08.022 ↗
35. 10.1063/1.144817510.1063/1.1448175 ↗
36. 10.1063/1.148626410.1063/1.1486264 ↗
37. 10.1088/0268-1242/14/5/01010.1088/0268-1242/14/5/010 ↗
38. 10.1007/s11671-008-9130-810.1007/s11671-008-9130-8 ↗