journal article·2023-11Open access

4H-SiC Surface Modified by a Green Femtosecond Laser at Low Fluence

Authors not provided

Abstract

This study used a single femtosecond laser pulse with a wavelength of 515 nm to irradiate the 4H-SiC sample surface.The pulse energy was 1740-2110 nJ, and the effective fluence was around 1.27-1.54J/cm 2 .The ablation threshold is 1.26 J/cm 2 .The surface morphology and the ablation depth were measured by scanning electron microscopy (SEM) and atomic force microscope (AFM).The ablation depth is around 12 nm.On the other hand, a simplified model with a two-temperature model and dynamic optical model was used to predict the ablation threshold.The simulation result shows that the ablation threshold is around 1.2 J/cm 2 , which is matched the experimental results.
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Research context

OpenAlex topics: Silicon Carbide Semiconductor Technologies · Thin-Film Transistor Technologies · Advanced Surface Polishing Techniques

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