Growth of ruthenium dioxide nanostructures by micro-afterglow oxidation at atmospheric pressure
Source abstract
Abstract
Various ruthenium dioxide nanostructures were grown locally by the oxidation of ruthenium samples with an Ar-O-2 microwave micro-afterglow operated at atmospheric pressure. A special attention was paid to the distribution of the surface temperature of the sample which evolves between 530 K and 820 K. Whatever the treatment time, the temperature and the gas composition set within the studied ranges, a general nanostructure, made of lamellae separated by 20-50 nm, is found. When the temperature rises, localized nano-sea urchins, nanotubes with square sections, nano-needles, and more complex structures are found spread over the surface. Treated surfaces were characterized by different surface diagnostics (SEM, XRD, SIMS, etc.) Finally, a growth mechanism is proposed emphasizing the role of emerging defects and stress on the appearance of localized nanostructures.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Gas Sensing Nanomaterials and Sensors · ZnO doping and properties · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (41)
Show source-provided references
1. Nougaret · Thin Solid Films · 2007 · 515 · 397110.1016/j.tsf.2006.09.023 ↗
2. Joint Committee on Diffraction Standard (JCPDS)-International Center for Diffraction Data (ICDD), Powder Diffraction File, #40–1290.
3. Kim · Appl. Phys. Lett. · 1995 · 67 · 80710.1063/1.115450 ↗
4. Sakiyama · J. Electrochem. Soc. · 1993 · 140 · 83410.1149/1.2056168 ↗
5. Kolawa · Thin Solid Films · 1989 · 173 · 21710.1016/0040-6090(89)90137-5 ↗
6. Krusin-Elbaum · Appl. Phys. Lett. · 1987 · 50 · 187910.1063/1.97673 ↗
7. Vijay · J. Electrochem. Soc. · 1993 · 140 · 264010.1149/1.2220877 ↗
8. Patake · Appl. Surf. Sci. · 2008 · 254 · 282010.1016/j.apsusc.2007.10.044 ↗
9. Zhuiykov · Electrochem. Commun. · 2008 · 10 · 83910.1016/j.elecom.2008.03.007 ↗
10. Norga · Appl. Phys. Lett. · 2000 · 76 · 131810.1063/1.126021 ↗
11. Hartmann · Appl. Phys. A · 2000 · 70 · 23910.1007/s003390050041 ↗
12. Murahashi · Pure Appl. Chem. · 2002 · 74 · 1910.1351/pac200274010019 ↗
13. Hsieh · Appl. Phys. Lett. · 2004 · 85 · 386010.1063/1.1812373 ↗
14. Delmer · Adv. Mater. · 2008 · 20 · 50110.1002/adma.200701349 ↗
15. Ryden · Phys. Rev. B · 1970 · 1 · 149410.1103/PhysRevB.1.1494 ↗
16. Green · J. Electrochem. Soc. · 1985 · 132 · 267710.1149/1.2113647 ↗
17. Iembo · J. Mater. Res. · 1997 · 12 · 143310.1557/JMR.1997.0195 ↗
18. Kim · Electrochem. Solid-State Lett. · 2001 · 4 · A6210.1149/1.1359956 ↗
19. Kim · J. Electrochem. Soc. · 2004 · 151 · E710.1149/1.1631823 ↗
20. Satishkumar · J. Mater. Chem. · 2000 · 10 · 211510.1039/b002868l ↗
21. Cheng · Appl. Phys. Lett. · 2006 · 88 · 04311510.1063/1.2166481 ↗
22. Chen · Solid State Commun. · 2004 · 131 · 34910.1016/j.ssc.2004.06.002 ↗
23. Liu · Appl. Phys. Lett. · 2007 · 90 · 01310510.1063/1.2428669 ↗
24. Ernst · Surf. Interface Anal. · 2008 · 40 · 33410.1002/sia.2675 ↗
25. Reuter · Chem. Phys. Lett. · 2002 · 352 · 31110.1016/S0009-2614(01)01472-5 ↗
26. Chaston · Platin. Met. Rev. · 1975 · 19 · 13510.1595/003214075X194135140 ↗
27. Over · Appl. Phys. A · 2002 · 75 · 3710.1007/s003390101053 ↗
28. Blume · J. Phys. Chem. B · 2005 · 109 · 1405210.1021/jp044175x ↗
29. Sharma · IEEE Trans. Compon. Hybrids Manuf. Technol. · 1983 · 6 · 8910.1109/TCHMT.1983.1136145 ↗
30. Arnoult · Appl. Phys. Lett. · 2008 · 93 · 19150710.1063/1.3025564 ↗
31. Arnoult · Appl. Phys. Lett. · 2010 · 96 · 10150510.1063/1.3360228 ↗
32. Arnoult · J. Phys. D. Appl. Phys. · 2011 · 44 · 17402210.1088/0022-3727/44/17/174022 ↗
33. Cordfunke · Thermochim. Acta · 1989 · 139 · 9910.1016/0040-6031(89)87013-3 ↗
34. Ho · J. Phys. Chem. Ref. Data · 1972 · 1 · 27910.1063/1.3253100 ↗
35. Cordfunke · J. Phys. Chem. Solids · 1989 · 50 · 42910.1016/0022-3697(89)90444-7 ↗
36. Powell · J. Less-Common Met. · 1967 · 12 · 110.1016/0022-5088(67)90062-8 ↗
37. Han-Jie · Chin. Phys. · 2006 · 15 · 189210.1088/1009-1963/15/8/044 ↗
38. Hrbek · J. Vac. Sci. Technol. A · 1995 · 13 · 140910.1116/1.579573 ↗
39. Arnoult · Plasma Process. Polym. · 2012 · 9 · 112510.1002/ppap.201100191 ↗
40. Steeves · J. Vac. Sci. Technol. A · 2010 · 28 · 90610.1116/1.3273945 ↗
41. Li · J. Appl. Phys. · 2010 · 108 · 02430810.1063/1.3460635 ↗