Laser etching of 2D materials with single-layer precision up to ten layers

Patterned 2D materials with layer-controlled thickness and precise lateral resolution are of great potential for many applications. Laser etching is a promising technique for large-scale patterning of 2D materials, but better control in film thickness is strongly desired. Here, we explore the dynamic characteristics in the laser etching process in which a local temperature lock phenomenon is observed as laser power reaches the etching threshold. A layer-by-layer etching strategy is then developed based on the temporal evolution of the local temperature as measured by in-situ Raman spectroscopy. Employing such a method in a typical layered material MoS2, we demonstrate thickness control up to ten layers in layer-by-layer laser etching. The local temperature lock during laser etching is explained by thermodynamic simulation of temperature distribution within the 2D material under laser illumination. The influence of substrate thermal conductivity on the thickness of the controlled laser etching has been revealed. The results are valuable for potential applications of 2D material devices built with complex layered structures.