journal article·1994-12

Multifunction large area sputtering cathode

G.A. Garzino-Demo, F.L. Lama

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Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Metal and Thin Film Mechanics · Plasma Diagnostics and Applications · Copper Interconnects and Reliability

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References (9)

Show source-provided references
1. High deposition rate large area sputtering system with diode cathodes
2. Versatile cold cathode ion source for use with materials in any thermodynamic phase10.1063/1.1142854 ↗
3. Magnetron plasma deposition processes10.1016/0040-6090(89)90039-4 ↗
4. 1992
5. Vossen · 1978 · Vol. 1 · 14
6. Glow Discharge Processes
7. Physics of ion plating and ion beam deposition10.1116/1.1317915 ↗
8. Van Vechpen · J. Vac. Sci. Technol. · 1990 · A28 · 82110.1116/1.576925 ↗
9. Bovard · Thin Solid Films · 1991 · 206 · 22410.1016/0040-6090(91)90426-X ↗