Investigation of the mechanisms of magnetron sputtering of aluminium with mixtures of argon and nitrogen in the partially reactive mode
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Research context
OpenAlex topics: Metal and Thin Film Mechanics · Copper Interconnects and Reliability · Semiconductor materials and devices
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References (8)
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4. Schiller · Vacuum Technik · 1981 · 30 · 3
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6. Sobe · Contrib. Plasma Phys. · 1994 · 34 · 8110.1002/ctpp.2150340110 ↗
7. J. Schulte, G. Sobe, G. Reiss, Contrib. Plasma Phys. 37 (1997).10.1002/ctpp.2150370603 ↗
8. Affinito · J. Vac. Sci. Technol. A · 1984 · 2 · 127510.1116/1.572395 ↗