journal article·1998-08

Characterization of Particle Motion for Polishing and Texturing under AC Field by Using Particle Dispersion Type ER Fluid

Yoichi Akagami, Koichi Asari, Balachandaran Jeyadevan, Toyohisa Fujita

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Abstract

The authors have already proposed a new method of polishing using particle dispersion type ER fluid. And also have applied this method for polishing micro hole in a ceramic disk. In this paper, we characterize the particle dispersion type ER fluid and particle motion suitable for polishing and texturing. We selected the type of abrasive material to be used in ER fluid based on theoretical calculation of the force exerted by an individual particle under alternative electric field. And also, we have experimentally obtained the force generated by ER fluid dispersing diamond particles of different size range, concentrations and dispersing media with different viscosity. Furthermore, we have observed the particle response using a high-speed video camera.
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Research context

OpenAlex topics: Advanced Surface Polishing Techniques · Tunneling and Rock Mechanics · Surface Modification and Superhydrophobicity

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Akita Prefectural Industrial Technology Center, 4-11 Sanuki, Arayamachi, Akita, 010-1623, Japan

Faculty of Engineering and Resources Science, Akita University, 1-1, Tegata, Gakuenmachi, Akita, 010-8502, Japan.

References (4)

Show source-provided references
1. Y. Akagami
2. 2. K. Nuri and K. Itoh, Japanese Patent (submitted) 1995.
3. T. Fujita · J. Mining and Material Processing Institute of Japan · 1989 · 105
4. I. J. Lin · J. of Electrostatics · 15 · 53