Preparation and Structure of Nano-crystalline WO_3(Si) Thin Films by Pulsed Excimer Laser Deposition
Source abstract
Abstract
WOx thin films were successfully synthesized on Si (111) substrate at different con-ditions by using scanning excimer laser ablation technique. The structure of WOx thin filmsdeposited at different conditions was analyzed by STEM, XRD, RS. The thin films depositedat 300 and 400℃ under 20Pa oxygen pressure showed nano-crystalline triclinic structure. Theexperimental results illustrate that the oxygen pressure and the deposition temperature are twoimportant parameters for determining the structure and chemical composition of the synthesizedthin films.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Transition Metal Oxide Nanomaterials · Gas Sensing Nanomaterials and Sensors · Ga2O3 and related materials
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References
Reference metadata was not supplied for this record.