Preparation and Structure Characterization of YSZ Film by Sol-Gel Method

The YSZ film was prepared by sol-gel method. The effect of process conditions on the microstructurewas studied. Wc found that the major factors of the effect on the film cracking are the selection and cleaingof substrates, the rate of gelation, the velocity of the temperature rising and cooling in the heat treatmentprocess, XRD and SEM results showed that the YSZ film prepared by sol-gel method must be calcined atabove 8OO°C, to remove the acidic root, organic groups and carbon element, alld t0 form perfectly cubicphase structure. The film surface densified and pores decreased with the firing temperature increasing. At1050℃, the film surface becanme smooth, crackfree and porefree, the spkerical grain distributed uniformly.The film and substrate combined tightly, the thickness of the film was about 1.0μm.