Processing and Characterization of Graded B_4 C/Cu Facing Plasma Composite

Based on their distinct resistivity and melting point, a new approach for fabricat- ing graded B4C/Cu composite by rapid self-resistance sintering under ultra-high pressure was proposed in this paper and with which a near dense plasma facing material with 0～100% compo- sitional distributions of B4C was obtained on conditions of 12kW electric power input, 2～4GPa pressure applied, 40s duration and properly consecutive heat treatment. Well-graded composition and structure of that composite were demonstrated by SEM analysis. Tests on plasma relevant performances show that the chemical sputtering yield of B4C/Cu graded composite is 70% lower than that of SMF 800 nuclear graphite, and the surface of the composite is almost no damages after in-situ plasma irradiation in Tohamak apparatus.