XPS Studies of Synthesized B C N Films by Plasma Source Ion Nitriding

The synthesized boron nitride and boron carbon nitrogen films by plasma source ion nitriding were analyzed by X ray photoelectron spectroscopy(XPS) The effects of boron, carbon and nitrogen elements in the films on the XPS results were studied making use of the film characteristics with the controllable composition The XPS revealed that the formation of boron nitride films was confirmed but the sp 2 and sp 3 plain microdomain structures were difficult distinguished, and the formation and bonding structures of boron carbon nitrogen films could be determined The synthesized boron carbon nitrogen films possessed a mixing structure of sp 2 and sp 3 plain microdomains in the processes