Influence of the Substrate Temperature on the Properties of Nb-doped TiO2 Films Deposited by DC Magnetron Sputtering
Source abstract
Abstract
采用陶瓷靶直流磁控溅射, 以玻璃为基底制备2.5wt% Nb掺杂TiO 2 薄膜, 控制薄膜厚度在300~350 nm, 研究了不同基底温度下所制得薄膜的结构、形貌和光学特性. XRD分析表明, 基底温度为150℃、250℃和350℃时, 薄膜分别为非晶态、锐钛矿(101)和金红石相(110)结构. 基底温度250℃时, 锐钛矿相薄膜的晶粒尺寸最大, 约为 32 nm. 薄膜表面形貌的SEM分析显示, 薄膜粗糙度和致密度随基底温度升高得到改善. 薄膜的平均可见光透过率在基底温度为250℃以内约为70%, 随基底温度升高至350℃, 平均透过率下降为59%, 金红石相的存在不利于可见光透过. Nb掺杂TiO 2 薄膜的光学带宽在3.68~3.78 eV之间变化. 基底温度为250℃时, 锐钛矿相薄膜的禁带宽度最大, 为3.78 eV.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Gas Sensing Nanomaterials and Sensors · ZnO doping and properties · TiO2 Photocatalysis and Solar Cells
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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