Highly Adherent Diamond Film Deposited onto WC-Co Cemented Carbide Substrate

Diamond films were deposited onto WC-Co cemented carbide substrate by using microwave plasma chemical vapor deposition(CVD). The effects of TiNx interlayer introduced on the diamond film quality and its adhesion to the substrate were investigated. The results show that by pre-depositing TiNx interlayer in which nitrogen concentration changes gradually, the diamond film on the cemented carbide substrate etched by acid solution has very good quality; and its critical load measured by indentation test, is as high as 1000N.