Electrodeposition and Characterization of Cu_2O Thin Films on Transparent Conducting Glass

Electrochemical behavior of cuprous oxide was investigated by using the catholic reduction electrochemical method. The effects of some technological factors on Cu2O thin films electrodeposited on transparent conducting glass were also studied. Cu2O thin films were characterized by Talystep, X-ray diffraction (XRD) , scanning electron microscope (SEM) and X-ray photoelectron spectroscope (XPS). The optimum technological conditions were obtained as follows: the applied potential was -0.22 ~ -0.45V (vs SCE) , bath temperature was 60℃, bath pH was 5.5-6.0 and concentration of (CH3COO)2Cu was in the range 0.015-0.040mol/L. The results showed that with the increase of bath temperature, the grain size of Cu2O film increased from 0.2μm to 0.4μm and it started to have (111) preferred orientation at 60℃. The film had high purity and was porous.