The Geometric Contribution to Gauge Factor of Patterned Lines on Substrates
Source abstract
Abstract
Abstract: A semi-analytical approach is taken to calculate the geometric contribution to gauge factor for patterned lines on substrates. A finite element model is presented in which a line section is strained along its length, and cross-sectional dilatation is calculated for different line aspect ratios, and elastic properties of line and substrate. Results are bounded by analytical solutions for infinitely wide and tall lines. A simple experiment is posed for measuring Poisson's ratio and piezoresistivity of coatings, films or patterned structures.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Advanced Sensor Technologies Research · Metal and Thin Film Mechanics · Advanced Measurement and Metrology Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (11)
Show source-provided references
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