Effect of Annealing Temperature on the Structure and Tribological Property of a-C:H Film
Source abstract
Abstract
为研究环境温度对含氢无定形碳(a-C:H)膜结构和性能的影响, 将a-C:H膜在大气环境中进行高温退火处理,并借助红外光谱、拉曼光谱、X射线光电子能谱、3D表面分析仪和球盘摩擦试验机等手段对退火前后a-C:H膜的结构、组成和性能进行了系统地考察. 研究发现, 在较低的退火温度下(300℃), a-C:H膜结构无明显变化, 而其内应力降低, 摩擦学性能显著提高;在400℃和500℃下退火,膜结构发生明显变化并伴随严重氧化, 同时摩擦学性能降低甚至完全失效. 结果表明, 退火温度的选择对a-C:H膜的结构、组成及性能具有重要影响.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Metal and Thin Film Mechanics · Vacuum and Plasma Arcs
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (17)
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