Irradiation Damage of CaF2 with Different Yttrium Concentrations under 193 nm Laser
Source abstract
Abstract
Radiation resistance of CaF 2 crystal is one of the critical properties in the application of deep ultraviolet lithography, but the damage process under 193 nm laser irradiation is still unclear. This paper reports the damage behavior of CaF 2 crystals under 193 nm laser irradiation and the key defect factors affecting the damage. Through the 193 nm laser irradiation experiment, it is found that the crystal damage is mainly manifested as the radiation-induced color centers inside the crystal and the radiation-induced damage pits on the surface. Irradiation-induced color centers were analyzed by UV-visible spectrophotometer, and linear fitting was performed between absorption coefficients of different color centers and Y impurity contents. The results show that Y ion has a low-order orbit that overlaps with the
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Research context
OpenAlex topics: Laser-induced spectroscopy and plasma · Solid State Laser Technologies · Laser Design and Applications
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References (29)
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