Uniform Growth of Two-inch MPCVD Optical Grade Diamond Film
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Abstract
1,2 ，李成明 1 (1.北京科技大学 新材料技术研究院，北京 100083；2.北京科技大学 顺德研究生院，佛山 528399；3.北方工 业大学 机械与材料工程学院，北京 100144) 摘 要: 大尺寸光学级金刚石膜的均匀生长一直是微波化学气相沉积(Microwave plasma chemical vapor deposition， MPCVD)金刚石研究领域的热点和难点之一，沉积台的结构与位置对于金刚石膜均匀性以及厚膜生长的长期稳定 性至关重要。本研究通过 COMSOL 模拟结合实验研究了沉积台高度对衬底表面电场均匀性、等离子体状态和温度 均匀性的影响规律，优化了光学级金刚石膜均匀生长的工艺参数，在最佳的沉积台(高度 2 mm)下沉积得到的 2 英 寸金刚石膜(最大厚度 337 μm)，厚度不均匀性＜11%，从膜中心到边缘的拉曼半峰全宽为 3~4 cm -1 ，可见光波段内 最高透过率为 69%~70%，10.6 μm 处红外透过率为 70%。结果表明：金刚石膜的厚度和品质较为均匀，实现了两
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OpenAlex topics: Advanced Fiber Laser Technologies · Diamond and Carbon-based Materials Research · Semiconductor Lasers and Optical Devices
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References (23)
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