Ag Doped Amorphous Carbon Films: Structure, Mechanical and Electrical Behaviors
Source abstract
Abstract
By adjusting sputter current from 1.3 A to 2.0 A in reactive magnetron sputtering deposition processes, Ag doped amorphous carbon films (a-C:Ag) with doping content from 0.7at% to 41.4at% were prepared. The influence of Ag content on structure, component, mechanical and electrical properties of a-C:Ag films were systematically studied.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Diamond and Carbon-based Materials Research · Lubricants and Their Additives · Tribology and Wear Analysis
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