Preparation of 3-inch Diamond Film on Silicon Substrate for Thermal Management
Source abstract
Abstract
首先对微波谐振腔内的等离子体进行多物理 场自洽建模，通过仿真模拟技术分析了 2.45 GHz 多模椭球谐振腔微波等离子体化学气相沉积(Microwave plasma chemical vapor deposition, MPCVD)装置沉积大尺寸金刚石薄膜的可行性，并优化了生长工艺参数。然后对金刚石 薄膜进行研磨抛光处理，以满足 GaN 器件的键合需求。模拟结果表明，相同的微波功率输入下，腔室压强增大导 致等离子核心电子和原子 H 数密度增加，但径向分布均匀性变差。在优化的工艺条件下进行了金刚薄膜的沉积。 实验结果表明，金刚石薄膜厚度不均匀性为 17%。较高的甲烷浓度导致金刚石晶粒呈现以(111)面为主的金字塔形 貌特征，并伴有孪晶的生成。Raman 光谱的金刚石一阶特征峰半峰全宽(Full width at half maximum, FWHM)
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Research context
OpenAlex topics: Diamond and Carbon-based Materials Research
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