DataVXJournal of Inorganic MaterialsPaper
journal article·2014Open access

Alumina Thin Film Coated Ammonium Dinitramide Fabricated by Atomic Layer Deposition

GONG Ting, QIN Li-Jun, YAN Rui, HU Lan, JI Yue-Ping, FENG Hao

Journal of Inorganic Materials· Volume 29· Issue 8
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Source abstract

Abstract

: (ALD)(ADN) (SEM), X (XPS) ADN , (VSA) ADN , ADN : ALD ADN , ALD ADN 48 h 25, 70%, VSA 200 400 ADN 40.99% 40.75% , ALD ADN , ADN
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short

Research context

Materials processing

OpenAlex topics: Semiconductor materials and devices · Catalytic Processes in Materials Science · Electronic and Structural Properties of Oxides

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References

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