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journal article·2024-11Open access

Directed Self‐Assembly of Polystyrene‐Block‐Polyhedral Oligomeric Silsesquioxane Monolayer by Nano‐Trench for Nanopatterning (Small 48/2024)

Cheng‐Hsun Tung, Feng Ye, Wei‐Yi Li, The Anh Nguyen, Ming‐Chang Lee, Tao Wen, Zi‐Hao Guo, Stephen Z. D. Cheng, Rong‐Ming Ho

Small· Volume 20· Issue 48
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Source abstract

Abstract

Nanopatterning In article number 2403581, Stephen Z. D. Cheng, Rong-Ming Ho, and co-workers demonstrate well-defined line nanopatterns with sub-10 nm feature size fabricated via directed self-assembly of POSS-based giant surfactant. This giant surfactant exhibits strong segregation strength, and fast self-assembly as well as excellent etching contrast, enabling reactive ion etching to create topographic nanopatterns. This bottom-up approach suggests a cost-effective method for next-generation lithography applications.
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Research context

Nanomaterials

OpenAlex topics: Silicone and Siloxane Chemistry · Dendrimers and Hyperbranched Polymers · Synthesis and properties of polymers

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Chemical Engineering National Tsing Hua University Hsinchu 30013 Taiwan

South China Advanced Institute for Soft Matter Science and Technology, School of Molecular Science and Engineering South China University of Technology Guangzhou 510640 China

Guangdong Provincial Key Laboratory of Functional and Intelligent Hybrid Materials and Devices South China University of Technology Guangzhou 510640 China

Department of Electrical Engineering National Tsing Hua University Hsinchu 30013 Taiwan

International School, Vietnam National University, Hanoi 144 Xuan Thuy Str., Cau Giay Dist. Hanoi Vietnam

Department of Polymer Science School of Polymer Science and Polymer Engineering University of Akron Akron OH 44325‐3909 USA

References

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