Plasmonics: Resistless Nanoimprinting in Metal for Plasmonic Nanostructures (Small 22/2013)
Source abstract
Abstract
A simple metal nanopatterning process named resistless nanoimprinting in metal (RNIM) is proposed and demonstrated by Y. Xuan, M. Qi, and co-workers on page 3778. This allows metal films to be directly imprinted at low temperatures and low pressures without the need for resists or any intermediate layers. High-resolution patterns with smooth and vertical side-walls are generated on metals such as Ag and Au. The RNIM process can be used to pattern metals for applications in plasmonics, metamaterials, biological sensing, and microfluidics. A vivid image of a butterfly seen through a perforated metal film is illustrated in the cover image as a demonstration of extraordinary optical transmission.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques
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References
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