journal article·2022-07

A Noise Immune Double Suspended Gate MOSFET for Ultra Low-Power Applications

Savio Jay Sengupta, Bijoy Goswami, Pritam Das, Subir Kumar Sarkar

Silicon· Volume 14· Issue 10
Publisher page

Abstract

Abstract PurposeThe purpose of this paper is to develop the design and analytical modelling of a noise immune double suspended gate MOSFET (DSG-MOSFET) for ultra-low power applications. Also, Important performance parameters of the proposed structure such as pull-in and pull-out voltages have been thoroughly investigated with respect to the valuable structural parameters.MethodsThe design methodology used is EKV based analytical approach to calculate the pull-in and pull-out voltages with ingeniously developed boundary conditions which helps achieving reasonably accurate result. Also, the I-V characteristics has been modelled to justify accuracy.ResultsThe experimental result shows that the pull-in and pull-out voltages are in millivolts and microvolts range and hence it can be used in ultra-low power applications. As the ratio between the pull-out and the pull-in voltage is 10^(+3) range, justifies that the proposed structure is noise immune. The ID-VGS characteristic has hysteresis and this sharp transition in pull-in and pull-out voltage indicates that it can be used as an ideal switch with infinite sub-threshold slope.ConclusionThis paper presents a compact EKV based analytical modelling of pull-in and pull-out voltages for a DSG-MOSFET which predict the device characteristics reasonably similar to simulated results. Also, for the first time the noise immunity for a DSGMOSFET has been analyzed.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: Semiconductor materials and devices · Advancements in Semiconductor Devices and Circuit Design · Silicon Carbide Semiconductor Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (19)

Show source-provided references
1. “INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS,” https://www.semiconductors.org/wp-content/uploads/2018/08/2001YieldEnhance.pdf, accessed December 2020
2. Akarvardar K, Eggimann C, Tsamados D, et al. (2007) “Analytical modeling of the suspended-gate FET and design insights for digital logic”2007 65th annual device research conference10.1109/DRC.2007.4373670 ↗
3. Blackburn GF, Levy M, Janata J (1983) Field-effect transistor sensitive to dipolar molecules. Applied Physics Letters 43(7):700–70110.1063/1.94536 ↗
4. Dai C-L, Tai Y-W, Kao P-H (2007) Modeling and Fabrication of Micro FET Pressure Sensor with Circuits. Sensors 7(12):3386–339810.3390/s7123386 ↗
5. Abele N, Segueni K, Boucart K, et al. (2006) “Ultra-low voltage MEMS resonator based on RSG-MOSFET”19th IEEE International conference on micro electro mechanical systems
6. Ionescu A, Pott V, Fritschi R, et al. (2002) “Modeling and design of a low-voltage SOI suspended-gate MOSFET (SG-MOSFET) with a metal-over-gate architecture”proceedings International symposium on quality electronic design
7. Abele N, Fritschi R, Boucart K, Casset F, Ancey P, Ionescu A (2005) “Suspended-gate MOSFET: bringing new MEMS functionality into solid-state MOS transistor”IEEE InternationalElectron devices meeting, 2005. IEDM Technical Digest
8. Abelé N, Pott V, Boucart K et al (2005) Comparison of RSG-MOSFET and capacitive MEMS resonator detection. Electronics Letters 41(5):24210.1049/el:20047409 ↗
9. Abele N, Villaret A, Gangadharaiah A, Gabioud C, Ancey P, Ionescu A (2006) “1T MEMS memory based on suspended gate MOSFET”2006 International Electron devices meeting10.1109/IEDM.2006.346826 ↗
10. Pruvost B, Mizuta H, Oda S (2007) “3-D design and analysis of functional NEMS-gate MOSFETs and SETs”IEEE transactions on. Nanotechnology 6(2):218–224
11. Nagami T, Mizuta H, Momo N et al (2007) Three-Dimensional Numerical Analysis of Switching Properties of High-Speed and Nonvolatile Nanoelectromechanical Memory. IEEE Transactions on Electron Devices 54(5):1132–113910.1109/TED.2007.893811 ↗
12. Frederico S, Hibert C, Fritschi R, Fluckiger P, Renaud P, Ionescu A (2003) “Silicon sacrificial layer dry etching (SSLDE) for free-standing RF MEMS architectures”The Sixteenth Annual International Conference on Micro Electro Mechanical Systems, MEMS-03 Kyoto. IEEE
13. Kam H, Lee D, Howe R, King TJ (2005) “A new nano-electro-mechanical field effect transistor (NEMFET) design for low-power electronics”IEEE InternationalElectron devices meeting, 2005. IEDM Technical Digest
14. Enz CC, Krummenacher F, Vittoz EA (1995) “An Analytical MOS Transistor Model Valid in All Regions of Operation and Dedicated to Low-Voltage and Low-Current Applications”Low-Voltage Low-Power Analog Integrated Circuits, pp. 83–11410.1007/978-1-4615-2283-6_7 ↗
15. Mahfoz-Kotb H, Salaun A, Mohammed-Brahim T, Bonnaud O (2003) Air-gap polycrystalline silicon thin-film transistors for fully integrated sensors. IEEE Electron Device Letters 24(3):165–16710.1109/LED.2003.809536 ↗
16. Tripp MK, Stampfer C, Miller DC et al (2006) The mechanical properties of atomic layer deposited alumina for use in micro- and nano-electromechanical systems. Sensors and Actuators A: Physical 130–131:419–42910.1016/j.sna.2006.01.029 ↗
17. Jang D-Y, Kim Y-P, Kim H-S, Park S-HK, Choi S-Y, Choi Y-K (2007) Sublithographic vertical gold nanogap for label-free electrical detection of protein-ligand binding. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 25(2):44310.1116/1.2713403 ↗
18. Nicolas A, Ionescu MA, Ancey P (2007) “Design and fabrication of suspended-gate MOSFETs for MEMS resonator, switch and memory applications”
19. Fritschi R, Frédérico S, Hibert C, Flückiger P, Renaud P, Tsamados D, Boussey J, Chovet A, Udrea RKM, Ng F, Curty J-P, Dehollain C, Declercq M, Ionescu AM (2004) High tuning range AlSi RF MEMS capacitors fabricated with sacrificial amorphous silicon surface micromachining. Microelectron Eng 73–74:447–451. https://doi.org/10.1016/j.mee.2004.03.01510.1016/j.mee.2004.03.015 ↗