journal article·2015Open access

Online Test Structure for Measuring Young’s Modulus and Residual Stress of the Top Silicon Layer of Silicon-On-Insulator by a Pull-in Approach

Authors not provided

Abstract

The refractive indexes of thin films are determined by spectrophotometric measurement in the ultraviolet-to-near-infrared spectral range on a high-absorption metal, molybdenum, as an example.In our theoretical derivative, the refractive indexes of a substrate with and without low absorption are calculated first and then that of the combined film stack is calculated.Both solutions are obtained by the Newton-Raphson iteration method.The calculated refraction index is 1.64-2.88and the extinction coefficient is 2.76-4.52,which are within the measured ranges for the Mo film.Both indexes increase monotonically with the wavelength in the visible and near-infrared ranges.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Advanced Surface Polishing Techniques · Thin-Film Transistor Technologies · Integrated Circuits and Semiconductor Failure Analysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References

Reference metadata was not supplied for this record.