Statistical mechanics approach to dislocation cell patterning
Source abstract
Abstract
Based on the notion that dislocation patterning is a dissipative far-from-equilibrium process with intrinsic fluctuations acting on the evolution of the dislocation ensemble at the mesoscopic scale, a stochastic dislocation dynamics model is presented the analysis of which shows that fluctuations can induce patterning by dynamically stabilizing non-uniform dislocation distributions.
Source: expertdata · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: nanoparticles nucleation surface interactions · Metal and Thin Film Mechanics · Aluminum Alloy Microstructure Properties
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