journal article·1996-03

Reactivity and molecular structure of silicon-oxygen-carbon-containing films derived from organometallic chemical vapor deposition (OMCVD)

Terence J. Clark

Scripta Materialia· Volume 34· Issue 5
Publisher page

Abstract

No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.

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Research context

OpenAlex topics: Semiconductor materials and devices · Silicon Nanostructures and Photoluminescence · Copper Interconnects and Reliability

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References (2)

Show source-provided references
1. Schreck · J. Mater. Sci. · 1992 · 27 · 424310.1007/BF01105134 ↗
2. Ingo · High Temperature Science · 1990 · 28 · 137