Modification of the Ni-NiO-oxidant system by thermo-chemical oxidation with accelerated growth of the p-type dielectric oxide layer, by the action of substituted V2O5 on the system
Source abstract
Abstract
Nickel is covered with very thin oxide film and is stable against corrosion under normal conditions. Nickel, as Ni-NiO-oxidant system, can make much thicker (even a thousand times) and more corrosion unstable oxides. With certain new oxidation process parameters, nickel can undergo so-called accelerated oxidation. The subject and goal of this work is to find the most favorable conditions for performing of accelerated - catastrophic Ni oxidation process, when substitution of V2O5 is carried out into NiO (2V??? (Ni)), with significant electron concentration increase and oxygen surplus. Unlimited main and secondary charge carriers transfer is significantly facilitated if oxide film with non-stoichiometric composition and defects is formed. The aim is to avoid compact oxide film formation by chemical-thermal treatments and to obtain porous and defective NiO. By using oxidized system Ni - NiO - oxidant in glass, ceramics and evaporated metal technology, extraordinary usable value of this work is ensured.
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Research context
OpenAlex topics: Advanced Surface Polishing Techniques · Advancements in Solid Oxide Fuel Cells · Metallurgical Processes and Thermodynamics
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
University of Kragujevac, Faculty of Technical Sciences Čačak, Serbia
University of Niš, Faculty of Sciences and Mathematics, Serbian Academy of Inventors and Scientists, Serbia
References (12)
Show source-provided references
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