journal article·2007-01Open access

Removal properties of low-thermal-expansion materials with rotating-sphere elastic emission machining

Masahiko Kanaoka, Hideo Takino, Kazushi Nomura, Yuzo Mori, Hidekazu Mimura, Kazuto Yamauchi

Abstract

Optical mirrors used in extreme ultraviolet lithography systems require a figure accuracy and a roughness of about 0.1 nm rms. In addition, mirror substrates must be low-thermal-expansion materials. Thus, in this study, we processed two low-thermal-expansion materials, ULE [K. Hrdina, B. Hanson, P. Fenn, R. Sabia, Proc. SPIE 4688 (2002) 454.] (Corning Inc.) and Zerodur [I. Mitra, M.J. Davis, J. Alkemper, Rolf Müller, H. Kohlmann, L. Aschke, E. Mörsen, S. Ritter, H. Hack, W. Pannhorst, Proc. SPIE 4688 (2002) 462.] (SCHOTT AG), with elastic emission machining (EEM) in order to evaluate the removal properties. Consequently, we successfully calculated the respective removal rates, because removal volumes were found to be proportional to process times in EEM. Moreover, we demonstrated that the surface roughness of Zerodur is reduced to 0.1 nm rms in the spatial wavelength range from 100 mm to 1 mm. r 2007 NIMS and Elsevier Ltd. All rights reserved.
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Research context

OpenAlex topics: Advancements in Photolithography Techniques · Optical Coatings and Gratings · Calibration and Measurement Techniques

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References (6)

Show source-provided references
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