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journal article·2015-09-01Open access

Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH

Hiroyuki Oguchi, Shigehito Isobe, Hiroki Kuwano, Susumu Shiraki, Shin-ichi Orimo, Taro Hitosugi

APL Materials· Volume 3· Issue 9
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Source abstract

Abstract

We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250 °C under a hydrogen pressure of 1.3 × 10−2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm.
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Research context

Materials processing

OpenAlex topics: Hydrogen Storage and Materials · Quantum, superfluid, helium dynamics · Spacecraft and Cryogenic Technologies

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Tohoku University 1 Department of Nanomechanics, , Sendai 980-8579, Japan

Tohoku University 2 Micro System Integration Center ( μSIC ), , Sendai 980-0845, Japan

Hokkaido University 3 Creative Research Institution, , Sapporo 001-0021, Japan

Hokkaido University 4 Graduate School of Engineering, , Sapporo 060-8628, Japan

Tohoku University 5 Advanced Institute for Materials Research (AIMR), , Sendai 980-8577, Japan

Tohoku University 6 Institute for Materials Research, , Sendai 980-8577, Japan

Funding

Japan Society for the Promotion of Science · Ministry of Education, Culture, Sports, Science, and Technology

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