Influence of the deposition conditions on the magnetic properties of Fe–Co–N thin films
Source abstract
Abstract
(Fe 0.65Co 0.35) 1-xN x thin films were prepared by magnetron sputtering under various deposition conditions. Their structure and magnetic properties were studied systematically. A coercivity as low as 1.5 Oe was obtained with an optimal N content by adjusting the nitrogen partial pressure f N . Furthermore, the films exhibited resonance frequencies higher than 1 GHz and adjustable dynamic magnetic properties. The damping coefficient α was maintained at a low level of approximately 0.01 under an appropriate f N (4–10%). These effects were attributed to the composition and microstructure of the films, which directly determined the static magnetic properties and dynamic parameters of the films. Furthermore, under different deposition conditions with the same f N , the deposition rate, film thickness, and deposition gas pressure played significant roles in improving the magnetic properties of the films. Therefore, Fe–Co–N films with adjustable anisotropy are expected to be a potential material for microwave magnetic devices. Moreover, systematic studies of Fe–Co–N films can help optimize the magnetic properties of Fe–Co-based films.
Source: expertdata · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Magnetic properties of thin films · Magnetic Properties and Applications · Copper Interconnects and Reliability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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