Oxidation resistance and diffusion behavior of MoSi2/WSi2/(Nb,X)Si2 compound coating at 1400 °C
Source abstract
Abstract
Abstract MoSi2/WSi2/(Nb,X)Si2 compound coating showed outstanding oxidation resistance at 1400 °C. After oxidation for 100 h, the specimen kept good integrality and the parabolic rate constant of the scale growth was about 1.497 µm2 h−1. NbSi2 layer could improve the bonding of MoSi2/WSi2 layers to the substrate, postpone their degradation into porous sub-silicide layer and provide adequate Si for oxidation. The intense interdiffusion between MoSi2 and WSi2 layers would result in formation of pores in WSi2 layer and then weaken its barrier effect. In addition, a small amount of alloying elements Ti, Cr and Al from the substrate could diffuse through the MoSi2/WSi2 layers along the grain boundaries during oxidation. As a result, there are TiO2 formed in the scale. After oxidation for 100 h, a gradient compound layer of (Mo,W)Si2/(W,X)Si2/(Ti,Nb)5Si4 formed eventually.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Intermetallics and Advanced Alloy Properties · MXene and MAX Phase Materials · High-Temperature Coating Behaviors
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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