Hydrogen gas sensors based on PLD grown NiO thin film structures
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Abstract
Abstract NiO thin films were grown by pulsed laser deposition on (100)Si substrates at 200 °C temperature. The effect of the O2 pressure during the deposition process on the morphological, electrical and sensing properties of the films has been investigated. AFM images showed that the surface morphology of NiO films can be modified by the oxygen pressure during deposition. Electrical measurements showed that the well‐known native p‐type conductivity exhibits a conversion from p‐type to n‐type when the O2 pressure is reduced. Resistance responses of NiO‐thin films towards hydrogen (H2) flow in air ambient have been measured. NiO thin film p–n homojuctions were then fabricated to investigate the electrical properties of such structures. The p–n homojunctions exhibited the distinct rectifying current–voltage (I –V) characteristics. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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Research context
OpenAlex topics: Gas Sensing Nanomaterials and Sensors · Transition Metal Oxide Nanomaterials · ZnO doping and properties
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References (33)
Show source-provided references
1. 10.1016/j.snb.2004.04.10910.1016/j.snb.2004.04.109 ↗
2. 10.1016/j.snb.2003.06.00310.1016/j.snb.2003.06.003 ↗
3. 10.1016/S0925-4005(99)00440-210.1016/S0925-4005(99)00440-2 ↗
4. 10.1016/j.snb.2005.11.01810.1016/j.snb.2005.11.018 ↗
5. N.Brilis D.Tsamakis H. A.Ali S.Krishnamoorthy andA.Iliadis MRS Fall Meeting 2006 p. K7.35.
6. 10.1016/0040-6090(93)90636-410.1016/0040-6090(93)90636-4 ↗
7. 10.1016/S0042-207X(98)00011-610.1016/S0042-207X(98)00011-6 ↗
8. 10.1016/S0925-4005(03)00225-910.1016/S0925-4005(03)00225-9 ↗
9. 10.1016/0040-6090(83)90256-010.1016/0040-6090(83)90256-0 ↗
10. 10.1007/BF0240310610.1007/BF02403106 ↗
11. 10.1016/S0927-0248(00)00403-710.1016/S0927-0248(00)00403-7 ↗
12. Kumagai H. · J. Mater. Sci. Lett. · 1981 · 15 · 1996
13. 10.1016/S0925-4005(00)00427-510.1016/S0925-4005(00)00427-5 ↗
14. N.Brilis D.Tsamakis T. C.Xenidou A. G.Boudouvis E.Bourithis andM.Kompitsas 11th IMCS Brescia Italy 2006 poster presentation.
15. 10.1023/A:101865742456610.1023/A:1018657424566 ↗
16. 10.1016/j.apsusc.2006.09.04610.1016/j.apsusc.2006.09.046 ↗
17. 10.1016/j.solmat.2005.10.00310.1016/j.solmat.2005.10.003 ↗
18. 10.1016/S0167-2738(98)00310-510.1016/S0167-2738(98)00310-5 ↗
19. 10.1016/S0304-8853(00)01043-X10.1016/S0304-8853(00)01043-X ↗
20. 10.1016/S0304-8853(00)01042-810.1016/S0304-8853(00)01042-8 ↗
21. 10.1016/j.surfcoat.2004.10.03210.1016/j.surfcoat.2004.10.032 ↗
22. 10.1016/j.tsf.2004.11.21910.1016/j.tsf.2004.11.219 ↗
23. 10.1016/S0169-4332(01)00755-310.1016/S0169-4332(01)00755-3 ↗
24. 10.1088/0022-3735/9/11/03210.1088/0022-3735/9/11/032 ↗
25. 10.1007/BF0111603410.1007/BF01116034 ↗
26. 10.1080/1058458049089550910.1080/10584580490895509 ↗
27. 10.1103/PhysRevB.72.16541410.1103/PhysRevB.72.165414 ↗
28. Brinzari V. · J. Electron. Technol. · 2000 · 33 · 225
29. 10.1016/S0040-6090(01)00978-610.1016/S0040-6090(01)00978-6 ↗
30. 10.1016/S0925-4005(01)00761-410.1016/S0925-4005(01)00761-4 ↗
31. 10.1016/S0925-4005(99)00054-410.1016/S0925-4005(99)00054-4 ↗
32. 10.1016/j.snb.2003.10.02310.1016/j.snb.2003.10.023 ↗
33. 10.1016/0925-4005(91)80207-Z10.1016/0925-4005(91)80207-Z ↗