journal article·2016-09

Crystallization behavior during transparent In2O3‐ZnO film growth

Junjun Jia, Shin‐ichi Nakamura, Yuzo Shigesato

physica status solidi (a)· Volume 213· Issue 9
Publisher page

Abstract

Abstract Structural evolution of transparent conductive In2O3‐ZnO (IZO) films with increasing substrate temperature during sputtering was studied using transmission electron microscopy (TEM) and spectroscopic ellipsometry. Increasing the substrate temperature can induce film crystallization in the initial growth stage, and enhance the crystallization of IZO films. Extensive simulations using ellipsometry data demonstrated a decrease in the crystallization rate for IZO films deposited between 200 and 300 °C, which is attributed to the influence of the interference between nearby growing grains. TEM observations also reveal that the growth competition between different crystallites leads to an increase in the lateral grain size with increasing substrate temperature.
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Research context

OpenAlex topics: ZnO doping and properties · Thin-Film Transistor Technologies · Gas Sensing Nanomaterials and Sensors

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Affiliations

Graduate School of Science and Engineering, Aoyama Gakuin University, 5‐10‐1 Fuchinobe, Chuo, Sagamihara Kanagawa 252‐5258 Japan

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