journal article·1998-09

Transmission electron microscopy study of triple-ribbon contrast features in a ZnTe epitaxial layer

P.-D. Han

Philosophical Magazine Letters· Volume 78· Issue 3
Publisher page

Abstract

A transmission electron microscopy study of triple-ribbon contrast features in a ZnTe layer grown epitaxially on a vicinal GaAs (001) substrate is reported. The ribbons go through the layer as threading dislocations near the [112] (111) or [112] (111) directions. Each of these (with a 40 nm width) has two narrow parts enclosed by three partial dislocations (with a 20 nm spacing). By contrast analysis and contrast simulation, the ribbons have been shown to be composed of two partially overlapping stacking faults. Their origin is attributed to a forced reaction between two crossing perfect misfit dislocations.
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Research context

OpenAlex topics: Semiconductor Quantum Structures and Devices · Quantum Dots Synthesis And Properties · Chalcogenide Semiconductor Thin Films

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