journal article·1988-04

Convergent-beam electron diffraction study of strain modulation in GaAs/InGaAs superlattices grown by metal-organic chemical vapour deposition

K. K. Fung, P. K. York, G. E. Fernandez, J. A. Eades, J. J. Coleman

Philosophical Magazine Letters· Volume 57· Issue 4
Publisher page

Abstract

Abstract Convergent-beam electron diffraction has been used to study strain modulation in GaAs/InGaAs superlattices (6% In and 2% In) in plan-view. Reflections from planes inclined to the interface of the superlattice are split with sidebands, the angular separation of which is related to the modulation periodicity. It is inferred from higher-order Laue zone lines that inclined planes on opposite sides of an interface in GaAs and InGaAs layers are rotated towards and away from the interface as a result of distortion due to coherent matching and local relaxation in regions where the GaAs substrate and buffer layer have been ion-milled away.
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Research context

OpenAlex topics: Semiconductor materials and devices · Electronic and Structural Properties of Oxides · Semiconductor materials and interfaces

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References (13)

Show source-provided references
1. 10.1063/1.9453010.1063/1.94530 ↗
2. 10.1063/1.9467610.1063/1.94676 ↗
3. Cherns D. · Ultramicroscopy · 1987
4. Coleman, J. J. and Dapkus, P. D. 1985.Gallium Arsenide Technology, Edited by: Ferry, D. K. p. 79Indiana: H. W. Sas.
5. Humphreys, C. J. 1986.Eleventh International Congress on Electron Microscopy, Vol. 1, p. 105Tokyo: Japanese Society of Electron Microscopy.
6. 10.1016/0304-3991(87)90038-610.1016/0304-3991(87)90038-6 ↗
7. 10.1063/1.9551610.1063/1.95516 ↗
8. 10.1016/0167-577X(84)90111-310.1016/0167-577X(84)90111-3 ↗
9. Pouget J. P. · 1978
10. 10.1016/0304-3991(87)90080-510.1016/0304-3991(87)90080-5 ↗
11. Steeds, J. W. 1979.Introduction to Analytical Electron Microscopy, Edited by: Hren, J. J. p.387New York: Plenum.10.1007/978-1-4757-5581-7_15 ↗
12. Tanaka M. · J. Electron Microsc. · 1980 · 29 · 408
13. 10.1080/0950083870820524110.1080/09500838708205241 ↗