HVEMin situobservation of effects of an external compressive stress on the climb rate of interstitial loops
Source abstract
Abstract
Abstract The rate of climb of Frank loops of the interstitial type formed in silver during electron irradiation at 130°C in the presence of an external compressive stress has been studied using a combined in situ irradiation/deformation experiment in a high-voltage electron microscope. In the presence of the external compressive stress Frank loops are elongated in the direction nearly perpendicular to the external compressive stress. The results have been compared with those obtained previously but in the presence of an external tensile stress.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Advancements in Photolithography Techniques · Copper Interconnects and Reliability
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References (8)
Show source-provided references
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