Gold silicide precipitates in silicon
Source abstract
Abstract
Abstract This Letter describes the precipitation of gold in silicon from a highly supersaturated solution. After saturation of float-zone Si at 1275°C with gold, annealing experiments were performed at 850°C for various annealing times. By means of high-resolution electron microscopy, small particles (10–20 nm diameter) consisting of a metastable gold silicide were found. From selected-area diffraction patterns we deduce an orthorhombic unit cell with a = 0·960, b = 0·768 and c = 0·690 nm.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Semiconductor materials and interfaces · Surface and Thin Film Phenomena · Silicon Nanostructures and Photoluminescence
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (3)
Show source-provided references
1. 10.1016/0040-6090(80)90269-210.1016/0040-6090(80)90269-2 ↗
2. Okamoto H. · Bull. Alloy Phase Diagrams · 1983 · 4
3. 10.1007/BF0061761910.1007/BF00617619 ↗