Three-dimensional analysis of dislocation networks in GaN using weak-beam dark-field electron tomography
Source abstract
Abstract
We have developed a new method of tomographically reconstructing extended three-dimensional dislocation networks using weak-beam dark-field (WBDF) imaging in a TEM. A series of WBDF images is recorded every few degrees over a large tilt range, while ensuring that the dark-field reflection used for imaging maintains a constant deviation parameter. With suitable filtering of the WBDF images prior to tomographic reconstruction, the three-dimensional distribution of dislocations is reproduced with high fidelity and high spatial resolution. The success of this approach is demonstrated for heteroepitaxial Mg-doped GaN films. The fidelity of the tomographic reconstruction varies with the dislocation line-vector and elastic anisotropy of the material.
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Research context
OpenAlex topics: Advanced Electron Microscopy Techniques and Applications · GaN-based semiconductor devices and materials · Integrated Circuits and Semiconductor Failure Analysis
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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